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Keyword [Hafnium dioxide]
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1. Study Of High-k HfO2/SiO2 MOS Device Properties
2. Research And Design Of A New Type Of Ferroelectric Memory
3. Characterization of electronically active defects in hafnium dioxide high-kappa gate dielectrics
4. Reactions of high-k gate dielectrics: Studies in hafnium, zirconium, yttrium, and lanthanum-based dielectrics and in-situ infrared results for hafnium dioxide atomic layer deposition
5. Interface engineering and reliability characteristics of hafnium dioxide with poly silicon gate and dual metal (ruthenium-tantalum alloy, ruthenium) gate electrode for beyond 65 nm technology
6. Hafnium dioxide based gate dielectrics for nanoscale MOSFETs
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