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Keyword [Etch]
Result: 121 - 140 | Page: 7 of 8
121.
Highly selective PEC etching of gallium nitride device structures
122.
Kinetic Modeling of Halogen-Based Plasma Etching of Complex Oxide Films and its Application to Predictive Feature Profile Simulation
123.
Plasma etch characteristics of nitrogen trifluoride gas mixtures
124.
High-density plasma etching of III-nitrides: Process development, device applications and damage remediation
125.
Mechanism of fluoride-based etch and clean processes
126.
The chemical mechanisms of metal etching in high density plasmas
127.
Improving wafer temperature uniformity for etch applications
128.
Run-to-run control for wafer patterning in semiconductor manufacturing
129.
Characterization of shallow trench isolation etch line edge roughness
130.
Advanced plasma etching processes for dielectric materials in VLSI technology
131.
Plasma etch profiles modeling of silicon dioxide contact holes with etching and deposition
132.
Plasma density control for reactivate ion etch variation reduction in industrial microelectronics
133.
High precision plasma etch for pattern transfer: Towards fluorocarbon based atomic layer etchin
134.
Wafer-mounted sensor arrays for plasma etch processes
135.
Real-time feedback control and fault detection in deep-submicron plasma etch
136.
Identification and etch depth control of an ion milling process
137.
Computer-aided mask layout synthesis for anisotropic etch photolithography
138.
Modeling of plasma etch profiles with ions and reactive neutrals
139.
Anisotropic wet etch simulation using vector cellular automata
140.
Studies of the effects of fluorocarbon deposition and etching on silicon and silicon dioxide etching processes using methyl trifluoride in an inductively coupled plasma reactor, and the development of a reactive ion beam system for the study of plasma-sur
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