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Keyword [hafnium oxide]
Result: 21 - 40 | Page: 2 of 3
21. Preparation Of TiO2@HfO2/PVDF Dielectric Composites And Study On Their Dielectric And Energy Storage Properties
22. Phase Transformation And Dielectric Properties Of Calcium Doped Hafnium Oxide Films Prepared By Chemical Solution Deposition Method
23. Study On The Polarization Stability Of Hafnium Oxide-based Ferroelectric Thin Films
24. Study On 60Co ? Ray Total Dose Radiation Effect Of Fluorite-Type Zr-Doped Hafnium Oxide Ferroelectric Thin Film
25. Preparation Of Palladium-based Composite Catalyst And Its Catalytic Study In Suzuki-Miyaura Coupling Reaction
26. Preparation And Performance Research Of High-k Oxide Thin Film Transistors
27. First principles studies of point defects in hafnium oxide and silicon-hafnium oxide interfaces
28. Microstructure and electrical performance of sputter-deposited hafnium oxide thin films
29. Tungsten Doping Induced Superior Mechanical Properties of Hafnium Oxide for Energy Application
30. Hafnium oxide films for application as gate dielectrics
31. A study of hafnium oxide and zirconium oxide interfaces with silicon and silicon dioxide
32. Hafnium oxide as an alternative barrier to aluminum oxide for thermally stable niobium tunnel junctions
33. First principles studies of hafnium oxide-based gate stacks
34. Scatter loss and surface roughness of hafnium oxide thin films
35. Study of hafnium oxide films as a high dielectric constant material for IC applications: Their deposition and characterization
36. Development and characterization of layered, nitrogendoped hafnium oxide and aluminum oxide films for use as wide temperature capacitor dielectrics
37. Nanometric structure-property relationship in hafnium oxide thin films made by sputter-deposition
38. Processing, Structure and High Temperature Oxidation Properties of Polymer-Derived and Hafnium Oxide Based Ceramic Systems
39. Energy Storage And Pyroelectric Properties Of Silicon-doped Hafnium Oxide Antiferroelectric Thin Films
40. Study On Electrical And Photoelectric Properties Of Field-effect Transistors Based On Novel Hafnium Oxide-based Ferroelectric Films
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