boron-doped - Globe Thesis

Keyword [boron-doped] Result: 161 - 180 \| Page: 9 of 10
161.	Undoped and boron doped diamond nanoparticles as platinum and platinum-ruthenium catalyst support for direct methanol fuel cell application
162.	The use of boron-doped diamond film electrodes for the oxidative degradation of perfluorooctane sulfonate and trichloroethylene
163.	Structure-function relationship of boron-doped diamond thin-film electrodes and application for in vitro amperometric measurements
164.	The electrochemical oxidation and detection of ascorbic acid at hydrogen- and oxygen-terminated boron-doped diamond thin film electrodes
165.	Boron-doped diamond microelectrodes for neurochemical detection
166.	Determination of norepinephrine in rat tissue by reversed-phase HPLC separation and amperometric detection using a boron doped nanocrystalline thin film electrode
167.	The application of boron-doped diamond thin-film electrodes for water treatment and water quality monitoring
168.	Effects of surface termination of boron-doped diamond anodes on oxidation of aqueous compounds
169.	Finite element modeling the solid phase epitaxial growth of boron-doped silicon layers
170.	Electro-oxidation and detection of chlorinated phenols using boron-doped thin-film diamond electrodes
171.	Homoepitaxial deposition of boron-doped single crystal diamond
172.	Fabrication and characterization of thermomechanically processed sulfur and boron doped amorphous carbon films
173.	Boron doped nanostructured diamond films
174.	Optically transparent boron-doped diamond electrodes for chemical analysis
175.	Electrochemical detection of mercury, cadmium, lead, and copper using boron-doped diamond electrodes
176.	Trace detection of mercury using boron-doped diamond electrodes
177.	The electrochemical oxidation and amperometric detection of catechols and catecholamines at boron-doped diamond thin-film electrodes
178.	Boron doped ultrananocrystalline diamond powder: Alternative support material for PEMFCs
179.	Selective chemical vapor deposition of heavily boron doped silicon-germanium films from disilane, germane and chlorine for source/drain junctions of nanoscale CMOS
180.	Analysis and modeling of transient phenomena in boron-doped silicon
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