amorphous silicon - Globe Thesis

Keyword [amorphous silicon] Result: 61 - 80 \| Page: 4 of 6
61.	Development of polycrystalline and amorphous silicon carbide thin films for membrane-based MEMS devices
62.	Tribology of silicon nano-textured surfaces fabricated by rapid aluminum-induced crystallization of amorphous silicon
63.	The effects of low pressure helium ion bombardment on hydrogenated amorphous silicon
64.	Enhanced Crystallization of Amorphous Silicon Films with Silicon Nanocrystal Seeding
65.	Kinetic roughening during hot-wire chemical vapor deposition of hydrogenated amorphous silicon
66.	Triple junction amorphous silicon based flexible photovoltaic submodules on polyimide substrates
67.	Laser nucleated grain growth in hydrogenated amorphous silicon films
68.	Enhanced crystallization of amorphous silicon thin films by nano-crystallite seeding
69.	Stoichiometric Hydrogenated Amorphous Silicon Carbide Thin Film Synthesis Using DC-Saddle Plasma Enhanced Chemical Vapour Deposition
70.	Atomistic analysis of the surface reactivity, roughness, and crystallinity of plasma-deposited amorphous silicon thin films
71.	Microstructure, vacancies and voids in hydrogenated amorphous silicon
72.	Electronic transport and noise studies of amorphous and nano-structured hydrogenated silicon thin films
73.	Hydrogenated Amorphous Silicon Carbide Prepared using DC Saddle Field PECVD for Photovoltaic Applications
74.	Atmospheric pressure chemical vapour deposition of amorphous silicon carbide thin films onto fused quartz
75.	The specific heat of pure and hydrogenated amorphous silicon
76.	Nanocrystalline and amorphous silicon thin film transistors deposited by microwave plasma electron cyclotron resonance chemical vapor deposition: Material analysis, device fabrication and characterization
77.	Proton NMR studies of PECVD hydrogenated amorphous silicon films and HWCVD hydrogenated amorphous silicon films
78.	Fluctuation electron microscopy of medium range order in ion-implanted amorphous silicon
79.	Techniques and diagnostics on laser recrystallization of thin amorphous silicon films for flat panel display applications
80.	The effects of plasma-assisted chemical vapor deposition process variables on the properties of amorphous silicon carbide films
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