Vapor-deposited - Globe Thesis

Keyword [Vapor-deposited] Result: 21 - 40 \| Page: 2 of 3
21.	Processing - microstructure relationships of chemically vapor deposited zirconia fiber coating for environmentally durable silicon carbide/silicon carbide composites
22.	Experimental study of the microstructural evolution of chemical vapor deposited nickel upon annealing
23.	Interface reactions during processing of chemical vapor deposited yttrium oxide high-k dielectrics
24.	Synthesis, doping and characterization of chemical vapor deposited polycrystalline diamond and nanostructured carbon thin films for electronic applications
25.	Development of vapor deposited thin films for bio-microsystems
26.	Engineering vapor-deposited polyimides
27.	Failure mechanisms of platinum aluminide bond coat/electron beam-physical vapor deposited thermal barrier coatings
28.	Growth and characterization of vapor-deposited conjugated polymer thin films
29.	Low pressure chemical vapor deposited borosilicate glasses for materials integration applications
30.	Integration of polytetrafluoroethylene low-k dielectric material in a chemical vapor deposited aluminum metallization scheme
31.	Scanning tunneling microscopy of homo-epitaxial chemical vapor deposited diamond(100) films
32.	Microstructural evolution in chemically vapor deposited mullite coatings
33.	The mechanisms of formation of epitaxial cobalt silicide from chemical vapor deposited cobalt for microelectronics applications
34.	An investigation of the mechanical and physical issues of the adhesion of chemically vapor deposited (CVD) diamond coatings on cemented carbide cutting tool inserts (Cemented carbide tools, Chemical vapor deposition)
35.	Nucleation promotion and kinetics on chemical vapor-deposited thin films
36.	The use of rapid thermal chemical vapor deposited oxynitrides for advanced gate dielectrics
37.	Nucleation and growth of chemical vapor deposited diamond films
38.	Mechanical properties of chemical vapor deposited diamond
39.	Interface modifications to influence the adhesion of chemical vapor deposited diamond thin films
40.	Rapid thermal chemical vapor deposited sidewall spacer dielectrics for deep submicron MOSFET technology
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