Research On Hotspots Rapid Detection And Repair

As the semiconductor technology nodes scale down into the sub-micron era,the IC design becomes more and more complex.As a result,it is much difficult to use the Resolution Enhancement Technology(RET)to repair lithography hotspots.To solve the problem,a new Design for Manufacture(DFM)technology,Lithography Friendly Check(LFC)emerged,by which designer can detect and repair the Lithography hotspots at the design phase.As the design layout complexity increases,how to improve the LFC run efficiency without accuracy loss become more challenging.This dissertation proposes two LFC check run efficiency improving methods,including Process Window(PW)model optimization and Localization Hotspot Detection.The former could improve the simulation efficiency more than 30% and the latter,basing on hotspot library,with the optimized size of hotspot image,can improve the run efficiency more than 60%.Beside the above methods,another two special fast LFC check methods on reticle revision and solid IP are also mentioned in this dissertation.Conclusion is that the smaller region then the higher efficiency.After LFC check,the repairing guidance of the detected hotspot must be provided.Basing on the optimized hotspot library on which repairing split data have been collected,the repairing cycles of the design can drop at least 50%.