Research On The Interference Lithography Technology For The Micro-structure Of Bionic Self-cleaning Surface

Currently there are some great progresses for artificial self-cleaning surface. Some technologies have been applied in practice, but the common disadvantages of these existing technologies is that the process according to demands can’t be adjusted flexible to achieve desired surface wettability. So a controllable, convenient, economical and practical method is necessary to be developed.Based on the investigated of self-cleaning structure preparation methods, the limitation of these methods has been discussed. Combined with the characteristics of the self-cleaning structure and the interference lithography pattern, a new method for self-cleaning surface preparation has been proposed. The requirement of self-cleaning structure has been analyzed by self-cleaning principle. The fundamental and the implement method of laser interference lithography has been investigated, the patterns have been simulated for multi-beam laser interference by MATLAB program. A number of factors that affect the lithography results have been analyzed. Based on these theories have been researched, the experimental system has been built, and a number of experimental has been researched.The results show that, the periodic structure formed by interference lithography is similar with the natural self-cleaning structure. Micro-structures with different period and shape can be obtained based on different process for different demands.Micro-structures with different periods from 1～100μm have been prepared. The wettability of these micro-structures have been Measured, and compared with the smooth surface. The results show that the contacts angles of micro-structure surface has been increased or decreased, increased by 23%-68%, decreased by 14%-32%. The self-cleaning function could be controlled by lithography micro-structure.This dissertation apply interference lithography technique in the preparation of self-cleaning structure, provided a controlled technique to modify the wettability of surface. The results could provide the theoretical and experimental basis to support the preparation of self-cleaning structure with laser interference lithography technique.