Research Of The Characteristic Parameter Detection Method Of Micro-Nano Dual Structure

In the processing of micro-nano structure, the laser interference technology has some features, such as low cost, large field of view and high resolution and so on. Therefore, based on the theory of laser interference, this thesis uses laser interference technology to manufacture micro-nano structure with modulation phenomenon, namely micro-nano dual structure, and detects its characteristic parameters.This paper briefly introduces the theory of laser interference. It uses computer software to simulate laser interference for three, four, six beam. By controlling the related parameters interference, such as angle of incidence, spatial angle, and polarizing angle etc., to make a result that is an interference pattern with modulation phenomena. And this paper lists the different modulation interference phenomenon of different parameter combinations, and obtains the variations of the modulation phenomena.It focuses on the six-beam interference, which will be divided into two groups of three beams, the same group has the same angle of incidence, different spatial angular distribution, and interferes with the hexagon micro-nano dual structure. Six beams can be divided into two groups, a group of four light, a set of two beams of light are simulated, also interferes with the square micro-nano dual structure.The thesis builds a laser interference lithography system with633nm laser. By controlling the position of the mirror and the beam splitter, it gets three beam, four beam, six beam interference modulation map on the CCD,for image acquisition and signal processing respectively. It adopts the method of extracting interference image modulation direction profile curve to measure parameters, and gets modulation large cycle and small cycle, that are compared with the theoretical values. Meanwhile, it uses the high-power lasers to build six beam laser interference lithography systems, etches the structure on a silicon material. And by processing the etching structures in the same detection method, it extracts the characteristic parameters of large and small cycles.