Dynamic Modeling And Analysis Of5-DOF Clean Room Wafer Handling Robot

As the foundation of informationization, integrated circuit(IC) has agreat influence on economic development, social progress and nationalsecurity. And IC manufacturing equipments, as a pillar of the IC industry,play the pilot role in the developing progress of the industry. Cluster Toolshas become the main equipment in semiconductor fields. Clean roomwafer handling robot is precisely the core component of Cluster Tools, inwafer transfer between various manufacturing equipments, its performancedirectly affects the reliability and automation level of the entire ClusterTools.This paper takes the clean room wafer handling robot as the object,and then set up its kinematics and dynamics model. And then the virtualprototype of the robot is built in ADAMS. B-spline is utilized to generatejoint trajectory, and then simulated in ADAMS virtual prototype. Thepaper also illustrates how to model the robot’s controller with MATLAB.At last, the controller and the virtual prototype are jointed for coordinatedsimulation, enabling the virtual prototype to interact with controller,providing the rationale basis for developing robot.