| Industry of the integrated circuits is the foundation of modern information industry. It is the core technology to transform and promote the traditional industry. With the rapid progress and deep research of microfabrication technology, feature line width have entered into the deep submicro domain progressively. E-beam Lithography technology represent the ripe technology in the field of deep submicro lithography. It is very practical and developed rapidly in recent years. High-resolution and good flexibility are remarkable advantages of this technology. All these advantages make the technology not only be in the major position but also play an important part in the research and production of nanometer device.This paper began with studying the fundamental principle of E-beam Lithography system and emphasized the control principle and control condition of Ee~-BES — 40AE-Beam exposure machine control system. Ee~-BES — 40A is the second generation E-beam Lithography system. It is a complication system consists of electron optics , precision optical machinery , ultra high vacuum , computer automatic control technologies. It is used for making figure mask and grating in LSIC (large scale integrated circuit) mainly. Mechanical part of this machine is very precise, and many technical indicators are still advanced in our country. Furbishing this machine can meet the research demand of micro-mechanism, biochip, laser device in recent years. But the computer which control this machine are behind the times very much, many fittings of the computer fill into disuse, thus they cannot be bought for maintaining the computer. This causes difficulty for furbishing Ee~-BES —40A E-Beam exposure machine. Besides, PC may offer a better performance, a faster processing speeds and a greater storage capacity. Therefore, we recommended PC to substitute the old computer of their control system. Beyond that the machine adopted raster scanning originally. As for E-Beam scanning , there is another manner, vector scanning. The flexibility andefficiency of vector scanning are higher than those of raster scanning. In the field of studying three-dimension processing where we will set foot in, figure of MEMS is more complicated, demand of flexibility for scanning figure improved greatly. Undoubtedly, choosing the vector scanning manner accorded with our demand of studying development even more. So that the next main point to improve the machine is changing scanning manner with vector scanning. Improving the control system of Ee'BES —40A E-Beam exposure machine will provide essential tool and prerequisite for experimentation of three-dimension processing with E-Beam, and will piay a positive role in promoting the development of microfabrication processing and MEMS.Ee'BES — 40A E-Beam exposure machine was controlled by three computers, which are main control computer Eclipse, professional computer Minicon and microcontroller 8080. In addition, the control system also included some measuring apparatus, drive interface and so on. After studying the control mechanism of the machine, this paper also made a deep research on the functions of some mechanical components such as column adjustment, mark detection, laser interfereometry system and stage profoundly. On the basis of grasping the control mechanism, the interface of components and correlateive control data, we devised improvement scheme for the machine control system, and devised the interface for PC in detail. These work will provid the foundation for the improvement of the control system of the complete machine. |
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