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The Research And Manufacture Of Static Induction Thyristor

Posted on:2010-02-26Degree:MasterType:Thesis
Country:ChinaCandidate:R ZhangFull Text:PDF
GTID:2178360275995753Subject:Microelectronics and Solid State Electronics
Abstract/Summary:PDF Full Text Request
Static induction thyristor(SITH) is one kinds of power device.SITHs have many advantages,such as a small gate current required to turn it on,high switching speed,high sensitivity of conducting,small power consumption,excellent thermal stability and so on. SITHs attracted many scientists' great attention and has gained significant developments because their excellent properties.The work in the present thesis has been carried out combining a scientific research item titled "The research and manufacture of Static Induction Device",which is sponsored by Lanzhou Science and Technology Committee. The key points in the present thesis are listed below:In this paper,we described the operational mechanism of SITH,the structure SITH,I-V characteristic,the theory of the current transition and the formation of channel barrier.The negative-resistance characteristics of SITH is researched,the important physical effects that result in the negative resistance characteristic inⅠ-Ⅴcharacteristic of SITH are analyzed.The importance of mesa and trenches etching are researched.The etching depth of partition trench,mesa and the gate electrode window are different from each other.It is conveniently that the three trenches can be etched simultaneously because of the smart design of three trench-layouts.The volume ratio of etching solution is studied by etching test and the best etching processes are determined.The process flow of SITH is organized.The normalⅠ-Ⅴcharacteristics are obtained by experimental study.
Keywords/Search Tags:SITH, Negative-resistance, Etching process
PDF Full Text Request
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