Research On Electrochemical Characteristics Of Silion/HF Interface

The paper researches the micro-reaction on silion/HF electrochemical system. At present, the use of the silicon / HF electrochemical etching silicon micro-channel systems have a wide range of applications such as micro-pump, microchannel plate, photonic crystal, etc. Electrochemical etching technology come from porous silicon technology and has the advantage of high ratio and low cost equipment.Therefore, the work of my thesis focus on a preliminary theoretical analysis and experimental study of micro-electrochemical reaction of the system of silicon / HF. Firstly, on the application of micro-channels as well as the related principles are described. After extensive investigation, I designed a silicon / HF electrochemical etching system by myself, and etched n-type silicon through the above-mentioned system. Secondly, a detailed analysis of the law of the channel formation, the mass effects, and dark current was to be. Finally, electrochemical parameters of the silicon/HF system (HF concentration of the solution, voltage, temperature, light, etc.) have been analyzed and optimized.