Study On Photolithography Technology Of Eight-step Binary Optical Elements

In this thesis, the development and fabricating method of binaryoptical elements are intrudced .Especially, manufacturing mask utilizinglaser direct writing, photolithography and Reactive ion etching areanalysesed and stueied.It makes the mask design,optimize structural parameter,compute ringradius of mask utilizing ZEMAX to refractive/diffractive system .Thenmanufacturing eight-step binary optical elements utilizing laser directwriting system, based on theory, structure and control parameter of laserdirect writing system.Primarly study on the technological parameter of binary opticalelements multi-mask photolithography and etching. To analyze the effect ofstep precision , include thickness,viscosity and gelatinize rotate rate,quantizing technological parameter;To discuss relationship between source, exposure time and resist,exposure strength. To analyze the effect of binary optical elements, includeetching rate,etching depth and ion beam density. Contrling menthods areintroduced.The thesis also introduce some research on vertial errors and lateralerrors involved in fabrication processes .Based on the analysis ,somesuggestions are offered to improve the fabrication procedure...