Further Investigation On Efficiency Improvement Of Mono-silicon Solar Cells

Solar cell technology is one of the hottest technologies in today's world. Due to its mature manufacturing technology, high efficiency, photovoltaic industry has been dominated by the Monocrystalline silicon solar cell. Problems on how to improve the efficiency of monocrystalline silicon solar cells and reduce its industrial cost have become the focus of numerous agencies. In this paper, a new anti-reflective-layer structure of production method combined the texture process widely used in industry and electrochemical etching has been proposed and researches on affecting factors about the process in single crystal silicon solar cells have been done. An anti-reflective-layer structure of production method combined the texture process and nanometer silicon is also been studied in this paper. This paper includes the following aspects:The first chapter introduces the current development of photovoltaic industry, particularly in the development of single crystal silicon solar cells. Then it introduces the main technical methods used in the single crystal silicon solar cells, techniques for improving efficiency of monocrystalline silicon solar cell, the basic process monocrystalline silicon solar cells and the work done in our research.The second chapter describes the improvement for electrochemical etching and texture technology used in single crystal silicon solar cell as well as the theory of electrochemical etching method and the impact on efficiency of solar cells.Chapter III studies the experimental method used in this paper to improve the efficiency of silicon cells. Firstly, we studied the impact on solar cell by means of the combination method of electrochemical etching and texture, from the experimental we can see that the average reflectance of solar cells can be reduced to 2%, and studied the affection from various parameters on the surface morphology solar cells in the electrochemical etching process. The paper also proposed an alternative preparation of nano-silicon anti-reflective layer in solar cells which is a very simple method of nano-silicon but can achieve a very excellent effect of reduction in reflectivity. The combination method of Nano-silicon and texture can make the reflectivity of the surface down to about 1%, which is even better than the combination method of electrochemical etching and texture.Chapter IV discussed the use of simulation and experimental method to study the influence of three-dimensional PN junction formed in solar cell on the surface absorption efficiency of solar cells as well as the photoelectric conversion efficiency.Chapter V summarized the work and achievements in this paper and predicted the wide usage of three-dimensional PN junction used in solar cell manufacturing industry.