Research On Temperature Control Model And Algorithm Of Internal Gas In Lithography Machine

There is a big gap between the lithography technology in our country and the world leading level.As one of the basic technologies of lithography,the micro environmental control technology is very important for the research and development of lithography technology.The temperature has a great impact on lithography imaging quality and resolution enhancement.In order to achieve high precision and stability temperature,it is necessary to research and analysis the related temperature control scheme,model and control algorithm.The main research and conclusions are as follows:First,this thesis analyzed the effect of the temperature on the lithography machine,discussed the temperature control scheme and temperature control technology,and then based on the system requirement,designed a direct heating and cooling of gas to achieve the goal of temperature control.The problem of gas temperature control is nonlinear,multi disturbance and large time delay,for these problems the thesis designed and analyzed a feedforward cascade control structure,cascade control structure can reduce the disturbance generated within the system,feedforward control can inhibit the impact of ambient temperature fluctuations effectively.Then this thesis used the mechanism analysis and system identification method to obtain the control model and the related parameters of each part of the system.On the basis of the control structure and control model,this thesis designed the algorithm and controller.And the controller adopted the hierarchical control algorithm and integral separation PI algorithm.Furthermore this thesis established the experiment platform of algorithm to test and analyze all aspects of the algorithm.The experiment results showed that the gas temperature control algorithm designed in this thesis can meet the control requirements of the system: 22 + 0.1? @30mins,and the stability and robustness of the algorithm can meet the performance requirements.