| Vacuum plasma cleaning has very important applications in the OLED manufacturing processes. But conventional plasma cleaning chamber limited by the vacuum conditions and capacity constraints, can not handle large substrates, as well as irregular parts. Atmospheric pressure plasma treatment breaks the vacuum limit, and has a broad development direction.At the same time,TCF as a kind of important materials in OLED production process has been dominated by ITO for a long time. More alternative materials are developed as shortage of In resources.Metal mesh as a substitute for ITO transparent conductive membrane material is a very important research direction.Firstly, in this thesis, the atmospheric pressure plasma jet which designed by our research team was used to treat different kinds of surface contamination in the OLED production process.1.The stripping rate was800nm per minute at a appropriate condition when stripping the photoresist. The NPB also could be stripped, but the Alq3could not. So, the atmospheric pressure plasma jet may can not treat the organics which contain metal elements.2.After using Ar plasma for metal surface treatment, contact angle went down from82degree to15degree. The metal surface hydrophilic was significantly improved.3. By adjusting the the and N2flow rates, the metal surface of the PCB changed from dark to bright when treated by the plasma. With improving the flow of H2, the effect was more obvious.Secondly, by studying the technology of making metal mesh conductive membrane, the conductive metal mesh on PMMA substrate was made by traditional wet etching process.But the phenomenon of wire break and adhesion in the process is the key problem which restricts the conductive property of the metal mesh.The dry etching and stripping technology to solve the problem of meatal wire break and adhesion in the traditional process was used. When the width of metal line is10um,visible light transmittance is74%. |
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