Characteristics Of Debris And Research Of Mitigation From Laser-produced Plasmas For Extreme Ultraviolet Lithography

Extreme ultraviolet light as the next generation lithography light very hopeful in14nm node into industrialized production of semiconductor chip technology, replacing193nm deep ultraviolet light source, and the corresponding extreme ultraviolet light etching technology will become the main way of lithography. At present, the obstacles to extreme ultraviolet laser plasma light source into one of the main factors for mass industrial production, is the laser plasma light source in the work process of clastic pollution problem. Due to the interaction between laser and target material in the working process of the light source to produce high temperature and high temperature plasma, radiate the wavelength of ultraviolet light, the process can produce is accompanied by the kinetic energy of ion particles and neutral, impact damage and pollution to collect ultraviolet multilayer mirrors, results in the decrease of light source output efficiency continuously, seriously affect the light source of long-term stability. In this paper based on the tin, gadolinium laser plasma ion in target material elastic dynamic characteristics of kinetic energy, angular distribution analysis of extreme ultraviolet laser plasma light source generation and propagation law of debris. And uses the filling ambient gas, applying transverse magnetic fields to slow down the ions and neutral particles, Analysis of related experimental conditions for light source debris slowing effect, given the optimization conditions of mitigation of debris from extreme ultraviolet light source.