Research And Design On Digital Lithography Control System

Micro-nano device characterized by microform dimension and micro manipulationscope, along with the development of Micro-and Nano technology, becomes a high&new-technology for exploring and rebuilding the world. The traditional micro-nanoprocessing control technology, facing many bottle-neck problems, such as the high costof manufacturing process not controlled effectively and the low automation degree ofprocessing, which restrict the development of the micro-nano processing technology.The novel micro-nano processing control technology of the digital lithography controlsystem, gives more promise for the micro-nano processing control technology in the21stcentury, solves the existing problems of the traditional micro-nano processing controltechnology.The overall frame of the worktable control, the light exposure control, the real-timeconvergence monitoring control, the digital masking diagram output control of thedigital lithography processing control system based on its unique characteristics. Topicson computer interface control technologies are discussed in details, together with thehardware control technologies, the realization of the control software. All of our effortsare concentrated on one purpose----to establish the hardware and software of thecomputer control systems suitable for the digital lithography fabrication, and to get ridof the bondage of traditional micro-nano processing.This paper analyzes the characteristics of digital lithography control system,determines the overall framework based on the requirement of this control system firstly.And then deploy the contents of research by item.Based on computer control technology, according to the kinematic characteristics of3D precise worktable, the core of which is the3D precision controller was designed. Itsucceeded in driving x, y, z spindles with accurate motion position control. As aninnovation, the precise control of the light exposure was achieved, including exposure,exposure time and real-time convergence control, which makes possible the linkedmotion of worktable, exposure control and real-time convergence control.After analyzing the design theory of MOE (Micro-Optical Element) in the digitallithography processing in detail. The visual interface for the control system was achieved, based on WINDOWS and Visual C++6.0. The control software of the digitallithography was developed.Finally, the function of digital lithography control system is validated, through theexperiment of lithography in the laboratory. In order to realize the function of software&hardware for the digital lithography control system, the further exploration will becarried out.