Magnetic Filtered Cathodic Vacuum Arc Plasma Preparation Of Tetrahedral Amorphous Carbon Films

Filtered Cathode Vacuum Arc Plasma Deposition System can filter the microdroplets associated with conventional arc evaporation. It is a new deposition technology for a range of metals and compounds films. Ad it seems as one of the best methods to deposition Tetrahedral Amorphous Carbon (ta-C) which has widespread applications for its unique properties.In this paper, the development, e principle and characters of cathode arc are introduced. It is also introduced of the Diamond-like Carbon (DLC) films. The paper describes controlling measurements of the equipment and discussed the mechanisms of growing ta-C. Meanwhile, the properties and characters of ta-C films are observed by Raman spectroscopy, Reflection High Energy Electron Diffraction (RHEED), AFM and other methods.Bias is the important factor in depositing films and the optimal bias is 75V in pulse filtered cathode vacuum arc deposition system. But the bias is 700V in direct current filtered cathode vacuum arc deposition system.