The Effects Of Low Energy N~+ Implantation On Processing Desert Oligotrophic Bacteria And Its Monte-carlo Simulation

China is one of serious desertification countries, and the area of desert is larger and wide distribution. In China, the desert of Gu Er Ban Tong Gu Te, with extensive development of biological crust that is an important biological factor to fix on the surface of sand, especial Desert Olitrophic Bacteria(DOB), is the largest fixed and semi-fixed desert, located in Xingjiang’s the center of junggar basin desert. The organization of the desert microbiotic crusts sharply suffered destruction is that people growing engineering activities had tremendously damaged to ecological environment.In a short time, the organization of the damaged biological crust is hard to obtain self-repaired. As a result, the surface of sand would be activated again, and become a new source area of the sandstorm, and make ecological environment worsening. So, it is crucial to studying the characteristic of the DOB.The Desert Olitrophic Bacterium 150(DOB150) were implanted by the 15 Kev N~+of different doses, and the "abnormal irradiation damage" curve for survival rate of DOB150 was obtained in this paper. In this experiment system, 10×1015 N~+/cm2 was viewed as an optimal implantation dose when the implantation energy was 15 Kev.This provided optimal implantation parameters to the study of low energy N~+ beam mediated gene transformation into desert oligotrophic bacteria. On this basis, 10 recombinant strains of the genetic stability were obtained, and provided a reliable biological materials for low energy ion implantation mediated DOB genome-wide mutation and molecular evolution research.In order to, in addition, learn more for the physical processes about 15 KeV N~+implantation into microorganisms, the Monte-Carlo Method was used to simulate the 15 Kev N~+ of different doses implanted into the DOB150 in this paper, and analyzed the case of the energy deposition, rang distribution, track structure, and target damage in the cell, and discussed the connection between the “ abnormal irradiation damage ” curve and energy deposition under different doses. Throughsimulation analysis, obtained conclusion that same dose of radiation sensitive areas,the more energy deposition, the greater cell death. At the same time, when implanted1.1×1011 N~+, single cell’s energy density was 570J/cm2. The chemical effect caused by energy deposition, in the medium dose of N~+ implantation, may induce some genes that make the oligotrophic bacteria damage reducing and the survival rate rising.Because micro-organisms are poor conductor of heat, this may lead a great deal of micro-organisms death under the action of thermal diffusion. The analysis results will provide useful reference to theoretical study of ion implantation microorganisms.