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The Preparation And Property Of DLC Films

Posted on:2003-12-05Degree:MasterType:Thesis
Country:ChinaCandidate:Z M WuFull Text:PDF
GTID:2132360092470450Subject:Materials Processing Engineering
Abstract/Summary:PDF Full Text Request
This paper has discussed preparing Diamond-like Carbon films by means of micro-wave ECR plasma source ion implantation and plasma enhanced chemical vapour deposition .We use the Raman spectrum ,FT-IR , AFM and so on to study the DLC film.The result indicates: different bias voltage, frequency and gas flow rate of PSII will have impact on sp3 proportion of DLC films, we find high bias voltage, low frequency and moderate gas flow rate can prepare high sp3 proportion DLC films; We simply illustrate the influence of bias voltage on sp3 proportion of DLC films in PECVD.
Keywords/Search Tags:Plasma source ion implantation, Plasma enhanced chemical vapour deposition, Diamond-like Carbon film
PDF Full Text Request
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