Preparation And Photocatalitic Property Study Of TiO₂ Thin Film Fabricated By Magnetron Sputtering

Nano-TiO₂ thin films were deposited by RF magnetron sputtering on substrates such as glass, ITO glass and aluminum (Al) foil at room temperature. With application of X-ray Diffractometer (XRD), Scanning Electron Microscope (SEM), Ultraviolet Visible light (UV-vis), their superficial morphology and structure were studied, and the influence facts on photocatalytic characteristics were discussed. The results were as follows:(1) With distance of 11cm between TiO₂ target of the substrate, sputter power 180w, the deposition rate of TiO₂ thin film decreases with the increasing of gas pressure from 0.2 Pa to 4.0 Pa. Moreover, when the gas pressure is 0.8 Pa, we can obtain the nano-TiO₂ thin film with surfaces uniformity and compactness.(2) The TiO₂ thin film deposited at room temperature is amorphous. Being annealed at 500℃, TiO₂ thin films become anatase, the crystallites grow bigger, surface potential reduce, a red-shift of UV absorbtion takes place, and its photocatalytic degradation of phenol is enhanced.(3) The degradation rate increases with increasing of the thickness of TiO₂ thin films. Moreover, the TiO₂ thin films deposited on aluminum foil exhibit better photocatalytic activity than on glass and ITO glass due to forming an Schottky barrier between TiO₂ and Al.