Study On Preparation Technology Of Spherical Thick Diamond Film

Spherical diamond thick films were prepared by DC plasma jet chemical vapor deposition (DCPCVD). Some factors that effected on high density nucleation and the uniformity of the spherical diamond thick film were studied. The film will be a promising material for the application of window materials in the future.The main works and the results obtained are as follows:1. Spherical diamond thick films were successfully prepared by DC plasma jet chemical vapor deposition method. The diameter, hardness and thickness of spherical diamond thick films are 65mm, 5mm and 500μm respectively. The quality of spherical diamond thick films was influenced by some factors such as CH4 concentrations, substrate temperature and the growth parameters of spherical diamond thick film were optimized accordingly.2. The nucleation density, surface morphology, composition and microstructure of spherical diamond thick films were investigated by the techniques of scanning electron microscope(SEM), Raman spectrum, X-ray diffraction(XRD) respectively, and it showed that high quality diamond films were prepared.3. The software of FLUENT was used to establish finite element simulation model of the system of diamond film growth, and the substrate temperature and flow fields of spherical diamond thick film affected by some deposition parameters was studied widely.4. A scheme about renovating DC plasma jet CVD substrate growth system was put forward, which would help to improve the quality of spherical diamond thick film.