Study Of Vacuum Ultraviolet Mirrors With High Reflectance

Highly Reflecting mirrors for vacuum ultraviolet has been widely used in various field, such as surface technology research, cosmic physics, life sciences and lithography for semiconductor and so on. The Reflecting mirrors played a very important role in this wavelength region.In this paper, the fractal method is used to calculate the roughness of the surface of substrate. The data given by AFM is been calculated. The new method of evaluating the roughness of the surface is given. A model based on Fresnel formula has been developed to calculate the maximum reflectance, and the results are compared with that of the experiments. The reflection characteristics of highly reflecting mirrors for vacuum ultraviolet are studied. The factors of deposition that refer to the reflectance such as materials of the substrate, thickness of the layer, and the cleaning process are analyzed. The results indicate that the thickness of the layer has a great affect on the reflectance and some fabricating parameters also have significant impact on the mirror's performance.