| Boron carbon nitride (BCN) attracts widespread interest as a promising technical material for many potential applications because of its unique physical and chemical properties. In recent years, both preparation and investigation on properties of this material have been became new hot points. The BCN thin films have been mainly synthesized by chemical vapor deposition (CVD). And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films. At present, more attentions have been focused on their mechanical and some electronic properties. It is important to note the optical properties of BCN thin films. And among the sputtering deposition methods, magnetron sputtering is quite limited as yet. Directly sputtering from h-BN and graphite targets has rarely been attempted. In this dissertation, the amorphous BCN thin films were deposited by radio frequency (RF) magnetron sputtering method on Si and glass substrates, respectively, the target is h-BN and graphite. And their transmission properties were investigated.In the first part of the dissertation, the author summarized the definition of thin films, the present situation and the bright future of thin film materials. The author introduced the background of the project, mainly discussed the advantages and defects of diamond and c-BN thin films, and analyzed the feasibility of preparing BCN thin films with their advantages. The author theoretically and experimentally summarized the present situation and problems of BCN thin films.In the second part of the dissertation, the author introduced the basic principles of sputtering and preparation of BCN thin films by RF magnetron sputtering technique. The most appropriate deposition parameters were found. They are target-substrate of 5cm, total work pressure of 1.3Pa. sputtering power of 80-130W, N2 partial pressure of 1/10-2/3, deposition temperature of 300-500℃, sputtering time...
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