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Keyword [Inductively Coupled Plasma Reactor]
Result: 1 - 2 | Page: 1 of 1
1.
Numerical Studies On Etch Profiles In Plasma
2.
Studies of the effects of fluorocarbon deposition and etching on silicon and silicon dioxide etching processes using methyl trifluoride in an inductively coupled plasma reactor, and the development of a reactive ion beam system for the study of plasma-sur
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