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Keyword [High-k dielectrics]
Result: 21 - 26 | Page: 2 of 2
21.
Interface engineering and reliability characteristics of hafnium dioxide with poly silicon gate and dual metal (ruthenium-tantalum alloy, ruthenium) gate electrode for beyond 65 nm technology
22.
Interface characterizations of atomic-layer-deposited high-k dielectrics on narrow bandgap semiconductors
23.
Charge Trapping Flash Memory With High-k Dielectrics
24.
Study on high-k dielectrics as alternative gate insulators for 0.1 micron and beyond ULSI applications
25.
Electrical properties of atomic layer deposited high-k dielectrics on Indium Nitride
26.
Research On The Application Of La-Based High-k Gate Dielectric In Graphene Field Effect Transistors
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